Nanoscale Fabrication and Characterization Facility (NFCF)

The NFCF supports the fabrication and characterization of nanoscale materials and structures, and integration of devices at all length scales. The facility houses advanced equipment with core nano-level (20 nm or below) capability for fabrication and characterization, including electron-beam lithography system, dual-beam system, plasma etching, thin film deposition, TEM, multifunctional scanning probe station, modular XRD, and more.